PL20-MA Semiconductor vacuum plasma cleaner

  

Friendly to environment, easy to operate

Replace traditional wet cleaning

Green environmental protection, low cost

Zero emission pollution

Ultra high frequency 13.56MHZ

Ultra high frequency 13.56MHZ

Plasma decontamination, surface activation

High sealing vacuum chamber

Can be customized

Multi-layer cavity size, customizable

Meet the requirements

Multiple gas channels supporting expansion ports

 

Product Parameter

 

Optional


Model       PL20-MA
Power frequency 40KHz/13.56MHz Gas flow control 0-500SCCM(MFC+-2%)
Capacity(L) 60\110\150\180\200 Gas channel Two-way (Addable):Ar、N2,H2、CF4、O2
Power (W) 0-1000(Adjustable) The layer number of
processing
11/15/17/17/21
Cavity dimensions(WxDxH) 400*450*400mm
500*450*500mm
500*500*600mm
500*600*600mm
500×580×700mm
Overall dimensions(WxDxH) 1000*1030*1630mm
1100*1030*1680mm
1200*1100*1730mm
1200*1200*1730mm
1250*1230*1790mm
Vacuum pump (Oil pump/dry pump + Roots combination) System control software self-developed V2.0
Vacuum degree 5-100Pa(Adjustable) Electrode ceramics Imported high frequency ceramics
Cavity material 316 stainless stee/imported aluminum alloy (Optional) Cavity temperature <30℃
Plasma generator 40KHz/13.56MHz(Optional) Control mode PLC + touch screen
Application field Products are suitable for optoelectronics, IGBT, MEMS, COMS and other semiconductor packaging links;
Plasma surface activation/cleaning, bonding after plasma treatment, plasma etching/activation, plasma degluing, plasma coating and
plating (hydrophilic, hydrophobic), enhanced binding, plasma coating, plasma ashing and surface modification and other occasions;